In the first half of NT-MDT has doubled the sales of probe microscopes

Results of the first half of the year, and as it turned out, the NT MDT is a very successful period. The volume of contracts for the supply of basic products — scanning probe microscopes — rose almost doubled compared to the same period last year.

The impressive growth was achieved in almost all the major regions of the world market. Thus, in U.S. growth was about 40% — in Europe more than 60% in China — more than three times? Significantly increased the amount of signed contracts for the post-Soviet space.


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It is noteworthy that the increase in global recognition products NT-MDT is happening against the background of intense research.

INTEGRA Spectra, which became in 2006 the honorary list of R & D100, and in 2010 awarded the prestigious Frost & Sullivan Best Practice Award, in 2011 has been modified to work with large size samples.


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Integra Life, equipped with a special mechanism to set the scanning and optical parts, today is probably the best solution in the field of scanning probe microscopy for cellular and subcellular experiments.


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Finally, NANEDYUKATOR second generation entered the list of the top 100 designs in 2011 (R & D100 Award).


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In this case, NT-MDT has traditionally maintained a high level of after sales and service, as well as information support for their users. We will continue to improve our equipment, so that scientists can make breakthrough discoveries with the comfort and pleasure!

In production of NT-MDT are:
NANOFAB 100 — UHV scientific and technological complex for the development and creation of elements of nanoelectronics, as well as for basic research in this area. The complex is the fact that, in a fully automatic mode to expose the same sample all sorts of influences (the methods that are now used to create microelectronics, but with a limit on the resolution of one to two orders of magnitude greater). Suitable for small-scale production. At present the development of the second generation of the platform, which has no analogues in the world for performance and availability of a set of methods of influence.


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NANOFAB-25 — The modular analytical technology platform NANOFAB 25 is designed to form complexes of nanotechnology, allowing not only to obtain nanostructures on substrates up to 25 mm in diameter, but also to conduct their physico-chemical analysis. The relatively small size and radial arrangement of nanotechnological systems allow you to post on the platform NANOFAB 25 in virtually any laboratory.


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Technological equipment ETNA-100-PT, installation of plasma etching is used for:
Sample plasma treatment up to 100 mm before subsequent processing steps, reactive plasma etching, including a wide variety of mask materials (semiconductors Si, Ge, GaAs, GaN, AII BVI, metals, dielectrics, oxides, nitrides) resistive mask after removing photolithography operations.


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Process equipment ETNA-MT-100 — a high-vacuum magnetron sputtering unit is designed for applying conductive, dielectric, semiconductor, multilayer multicomponent (depending on the number of sources) coatings, nitrides and oxides on the substrate up to 100 mm. Equipped with three types of sources: DC and pulsed RF power, it is possible in situ monitoring of the film growth.


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