Russian scientists have made a breakthrough in the field of optical printing

Russian scientists have made a breakthrough in the field of optical printing, offering innovative type of high resolution lithography — electrochemical X-ray lithography.

Researchers at the Faculty of Materials Science, Lomonosov Moscow State University, led by Andrey Eliseev published in the journal Angewante Chemie work on the optical non-contact printing of a new generation (the method of forming on the surface of the substrate electronic circuits and nanostructures), which should be a response to the challenge posed by manufacturers of microelectronics.

In his rapid development of microelectronics technology faces a lot of problems, and one of them — improving the kinds of lithography, necessary to further reduce the size of electrical component.

Electro-ray lithography combines the advantages of X-ray lithography with the versatility of electrochemical treatment. The unique combination of such a method of making impact-ray radiation with a wavelength in angstrom units (tenths of a nanometer), and electrochemical synthesis of new materials with ordered planar structure on the boundary between the solid substrate and the solution.

As a result, researchers were able to test structured layers of electrodeposited nickel metal on a flat silicon substrate with a deposited layer of gold. By using x-rays through a silicon mask, located at a distance of four micrometers, managed to increase the current in the deposition of nickel electrolyte substrate. This effect is made possible by the photoionization of substrates exposed to X-ray emission and the emission of photoelectrons in the volume of the electrolyte, which contributes to electrochemical reduction of nickel ions.

At present, such a method — the most advanced, although trends in this area appear with surprising regularity. The invention of Russians can be a serious competitor products already in use photolithography with a wavelength of 13 nm and x-ray lithography with a wavelength of 0.4-5 nm, which until recently were considered winners in the race for the nano-scale.

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